Application Software · LURIA
Precision. Control. Confidence.
Visitech’s dedicated lithography software is engineered for high-performance direct imaging — purpose-built for toolmakers in semiconductor and microfabrication, delivering high-resolution patterning with the accuracy and flexibility modern fabs require.
Proven reliability
A core part of every lithography subsystem
Field-proven for over a decade, our software suite helps customers accelerate development, meet stringent process requirements, and scale reliably from prototype to high-throughput production.
Software suite highlights
Advanced data warping
Dynamically compensates for optical distortion and substrate variation, ensuring fidelity across every exposure.
Die-shift compensation
Adjusts the projection in real time to accommodate die-placement variations, supporting tighter tolerances and higher process yields.
Panel warpage control
Tracks and corrects focus dynamically, adapting to wafer or panel topography to keep the image sharp.
3rd-party software compatibility
Standard interfaces for seamless integration with upstream and downstream lithography workflows.
Automatic system calibration
Built-in calibration and alignment tools cut setup time and ensure consistent long-term performance.
Made for system builders
A robust, flexible interface built for the rigorous demands of semiconductor manufacturing — empowering equipment manufacturers to push boundaries, scale production and lead the way. We develop, test and support the platform across lithography and additive manufacturing, enhancing performance, yield and usability.
Visitech inside
Ready to scale up your production?
Enable precision and cost-efficiency with Visitech inside.